Title:
CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3040998
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a chemical amplification type positive photoresist composition excellent in transparency to excimer laser light, dry etching resistance, sensitivity, resolution and developability and capable of forming a superior resist pattern by using a specified polymer, a specified low molecular compound, an acid generating agent and a solvent.
SOLUTION: The positive photoresist composition consists of a polymer having repeating units of formula I, an average molecular weight (expressed in terms of polystyrene) of 3,000-50,000 and a molecular weight distribution of 1.0-2.0, a low molecular compound of formula II, an acid generating agent and a solvent. In the formula I, R1 and R2 are each methyl, ethyl, t-butyl or the like, (l), (m), (n) and (o) show the ratio among the repeating units in the principal chain, l+m+n+o=1 and (o) is 0.4-0.6. In the formula II, R3 and R4 are each H or hydroxyl and R5 is lower alkyl or alkyl containing bicyclo[2,2,1]heptane or the like.
Inventors:
Park Joo-hyun
Seo Dong-Chur
Paksung-i
Kim Sung-Ju
Seo Dong-Chur
Paksung-i
Kim Sung-Ju
Application Number:
JP20242899A
Publication Date:
May 15, 2000
Filing Date:
July 16, 1999
Export Citation:
Assignee:
Corea Khunho Petrochemical Company Limited
International Classes:
C08F22/06; C08F32/00; C08G61/08; C08K5/10; C08L65/00; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; C08F22/06; C08F32/00; C08G61/08; C08K5/10; C08L65/00; G03F7/004; H01L21/027
Domestic Patent References:
| JP10316720A | ||||
| JP10218947A | ||||
| JP10130340A | ||||
| JP6123970A | ||||
| JP1155338A |
Attorney, Agent or Firm:
Yoshihiro Kodama