Title:
CHEMICAL AMPLIFICATION TYPE POSITIVE TYPE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2002196495
Kind Code:
A
Abstract:
To provide a positive type resist composition which has high transmittance at 157 nm of a F2 excimer laser.
The chemical amplification type positive type resist composition for a F2 excimer laser comprises a polymerization unit derived from an alicyclic hydrocarbon having a polymerizable carbon-carbon double bond in its ring, a resin which has a unit derived from a (meth)acrylonitrile, and an acid generator, wherein the resin, which itself is alkali-insoluble or hardly alkali-soluble, is characterized in that it is converted to be alkali-soluble by the action of an acid.
Inventors:
KAMIYA YASUNORI
HASHIMOTO KAZUHIKO
FUJISHIMA HIROAKI
HASHIMOTO KAZUHIKO
FUJISHIMA HIROAKI
Application Number:
JP2000390708A
Publication Date:
July 12, 2002
Filing Date:
December 22, 2000
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F220/44; C08F232/00; G03F7/033; G03F7/039; H01L21/027; G03F7/004; (IPC1-7): G03F7/039; C08F220/44; C08F232/00; G03F7/033; H01L21/027
Attorney, Agent or Firm:
Takashi Kuboyama (2 outside)