CHEMICAL LIQUID DISCHARGING NOZZLE

Japanese Patent JP3669601

B2

PROBLEM TO BE SOLVED: To quickly remove chemical liquid after completion of discharging by a method wherein the chemical liquid introduced by a chemical liquid flow passage is discharged onto a substrate surface from a chemical liquid discharging hole and further chemical liquid removing means constructing a shape of the lowermost part with a dot or a line is provided at a lower end part approaching a substrate.
SOLUTION: A developer discharging nozzle 4 flows a developer being chemical liquid introduced from a developer introduction pipe 6 to a flow passage 41, and a developer discharging hole 42 is formed so that it is radially discharged onto a surface of a substrate W from the flow passage 41. A developer removing part 43 having a recessed arc-shaped face is formed in a lower part of the developer discharging hole 42. In this arc-shaped face, a distance between two end points of the arc is aligned with a diameter of a lower end face of the developer discharging nozzle 4, further a center shaft of the arc-shaped face is aligned with a center shaft of the developer discharging nozzle 4, and then a lowermost end part of the developer discharging nozzle 4 is linearly formed. Thereby, even if the developer is adhered to an outer face of the developer discharging nozzle 4, it is possible to remove the adhesion for a short time and form a high quality pattern.

Hiroshi Yoshii

JP30949295A

July 13, 2005

November 28, 1995

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Dainippon Screen Mfg. Co., Ltd.

G03F7/30; B05C5/00; H01L21/02; H01L21/027; (IPC1-7): H01L21/02; B05C5/00; G03F7/30; H01L21/027

JP4053225A
JP5095011A
JP53143643A
JP4091751U
JP63201678U

Shiro Ogasawara

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