To provide a positive resist composition of a chemical amplification type which has high sensitivity and high resolution and is improved particularly in the rectangularity of a sectional shape and line edge roughness.
The chemical amplification type positive resist composition contains a resin which has (1): a polymerization unit having a group unstable to an acid expressed by formula (1a) of formula (1) and at least one polymerization unit selected from a group composed of the polymerization unit having a group unstable to an acid expressed by formula (1b) of formula (1) and (2): a polymerization unit derived from p-hydroxy styrene and which itself is insoluble or hardly soluble in an aqueous alkaline solution but is made soluble in the aqueous alkaline solution after the group unstable to the acid is cloven by the effect of the acid, an acid generating agent, and a nitrogenous compound having an alicyclic hydrocarbon group. In the formula (1), R1 and R2 respectively independently represent hydrogen atoms or methyl groups; R3 to R5 respectively independently represent 1-8C alkyl groups.
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SUETSUGU MASUMI
YOSHIDA ISAO
Toru Nakayama
Masayuki Enomoto