Title:
CLEANER AND DRYER, AND CLEANING AND DRYING METHOD OF SEMICONDUCTOR WAFER
Document Type and Number:
Japanese Patent JP2003297795
Kind Code:
A
Abstract:
To provide a cleaner and dryer, and a cleaning and drying method of a semiconductor wafer in which a cleaning and drying effect is enhanced, the waste of cleaning liquid is prevented by circulating and recycling used cleaning liquid, and environmental pollution is reduced.
Cleaning liquid composed of isopropylalcohol (IPA) and ultrapure water is premixed to have a desired concentration before being supplied to a treatment tank 11. Consequently, the removal of residual compounds by ultrapure water and the generation of a water spot by IPA are controlled efficiently. The cleaning and drying effect of a wafer is thereby enhanced and cleaning liquid can be recycled.
Inventors:
PARK JIN-KOO
LEE JOONG-YEON
YOON NEUNG-GOO
RI SHOKON
LEE SANG-HO
LEE JOONG-YEON
YOON NEUNG-GOO
RI SHOKON
LEE SANG-HO
Application Number:
JP2003051446A
Publication Date:
October 17, 2003
Filing Date:
February 27, 2003
Export Citation:
Assignee:
TECH LTD A
International Classes:
B08B3/00; H01L21/304; C23G1/00; H01L21/00; H01L21/30; H01L21/302; H01L21/306; (IPC1-7): H01L21/304
Domestic Patent References:
| JPH08211592A | 1996-08-20 | |||
| JPH0799177A | 1995-04-11 | |||
| JPH10128094A | 1998-05-19 | |||
| JPH08236494A | 1996-09-13 | |||
| JPH11233478A | 1999-08-27 | |||
| JPH1116873A | 1999-01-22 | |||
| JP2001308058A | 2001-11-02 | |||
| JPH09153475A | 1997-06-10 | |||
| JPH0861846A | 1996-03-08 |
Attorney, Agent or Firm:
Hattori Masaki
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