To obtain a cleaning equipment for semiconductor substrate in which a worker can visually catch the situation in the equipment readily, quickly and surely and occurrence of a failure can be dealt with quickly and readily.
The cleaning equipment for semiconductor substrate comprises a processing chamber 301 containing two chambers 101 for cleaning wafers carried therein, a transfer unit 302 incorporating a robot for transferring the wafer disposed on the back side of the processing chamber 301, a load port 303 for mounting an wafer carrier containing externally carried wafers disposed on the outside of the transfer unit 302, and a chemical unit 102 disposed on the side of the transfer unit 302 and the load port 303. A base section 309 serving as a work table while containing piping is provided at the lower section on the front side of the processing chamber 301. The processing chamber 301 has an opening 312 made from the front side between the ceiling part 305 and the wainscot panel part 308 to the substantially middle part on the side face side. The opening 312 is provided with a rolling transparent curtain 306 opening to the opposite side face sides from the central part on the front.
WADA NORIHIKO
UCHINO TOSHIYUKI
FUNAHASHI TOMOMASA
