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Title:
CLEANING METHOD OF THIN FILM FORMATION APPARATUS, THIN FILM FORMATION METHOD, THIN FILM FORMATION DEVICE, AND PROGRAM
Document Type and Number:
Japanese Patent JP2009117808
Kind Code:
A
Abstract:

To provide a thin film formation method which can efficiently form thin film, and to provide a thin film formation device and a program.

A control unit of a thin film forming device 1 feeds a cleaning gas from cleaning gas supply pipes 10a, 10b, 10c in cleaning treatment, and at the same time, feeds a dilution gas from a first treatment gas supply pipe 8 and a second treatment gas supply pipe 9. When deposit which adhered in the second treatment gas supply pipe 9 is removed, the flux rate of the dilution gas from the second treatment gas supply pipe 9 is reduced, as compared to those of the dilution gases from the first treatment gas supply pipe 8 and the cleaning gas supply pipe 10c, and then the cleaning gas is fed inside the second treatment gas supply pipe 9.


Inventors:
NODERA NOBUTAKE
SATO JUN
YAMAMOTO KAZUYA
HASEBE KAZUHIDE
Application Number:
JP2008253825A
Publication Date:
May 28, 2009
Filing Date:
September 30, 2008
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
C23C16/42; H01L21/31; C23C16/44; C23C16/455; H01L21/3065
Domestic Patent References:
JP2006287228A2006-10-19
JP2005167027A2005-06-23
JP2004311929A2004-11-04
JP2005286005A2005-10-13
JP2007142354A2007-06-07
Foreign References:
WO2004044970A12004-05-27
Attorney, Agent or Firm:
Kimura Mitsuru



 
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