To provide a cleaning system that removes residual ink and a dampening solution from the surface of an imaging member of a variable data lithography system.
A cleaning method for a variable data lithography system employs a first cleaning member 74 having a conformable adhesive surface disposed to be in physical contact with an imaging member 20. The first cleaning member adheres residual ink 76 remaining on the imaging member 20 after the transfer of an inked latent image from the imaging member 20 to a substrate to the conformable adhesive surface, thereby removing the residual ink from the imaging member 20. The cleaning method may further employ a second cleaning member 78 having a relatively hard and smooth surface and in physical contact with the first cleaning member 74. The second cleaning member separates the residual ink 76 removed from the imaging member 20 and adhering to the adhesive surface of the first cleaning member 74 to the second cleaning member 78.
PEETERS ERIC
SHERIDAN MARTIN
PATTEKAR ASHISH
ANDERSON GREGORY B
BIEGELSEN DAVID K
LARSON JAMES R
| JPH06297697A | 1994-10-25 | |||
| JPS5036212A | 1975-04-05 | |||
| JPS5514291A | 1980-01-31 | |||
| JP2007076040A | 2007-03-29 | |||
| JP2000506091A | 2000-05-23 | |||
| JP3008637B2 | 2000-02-14 |
| WO2007099848A1 | 2007-09-07 | |||
| US20100031838A1 | 2010-02-11 |
Kato Kazunori
Shinji Oga
Hiroyuki Hyakumoto
Next Patent: HEATED-INK APPLICATION ROLLER FOR VARIABLE DATA LITHOGRAPHY SYSTEM