Title:
CLEANING METHOD
Document Type and Number:
Japanese Patent JP2014201807
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for maintaining high picture quality without increasing image defects, shortening cleaning time, and reducing use of cleaning gas.SOLUTION: Provided is a method for cleaning the inside of a deposition film formation device for sequentially forming a deposition film made of an amorphous material containing a silicon atom and a hydrogen atom, and a deposition film made of an amorphous material containing a carbon atom. The method includes a first cleaning process S302 of cleaning the inside of the deposition film formation device with a plasma mainly containing an oxygen atom and a second cleaning process S303 of cleaning the inside of the deposition film formation device with plasma containing a fluorine atom.
Inventors:
YAMADA MOTOYA
OKAMURA TATSUJI
OKAMURA TATSUJI
Application Number:
JP2013080334A
Publication Date:
October 27, 2014
Filing Date:
April 08, 2013
Export Citation:
Assignee:
CANON KK
International Classes:
C23C16/44; G03G5/08; H01L21/205
Attorney, Agent or Firm:
Kenji Katsurada
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