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Title:
COATING APPARATUS
Document Type and Number:
Japanese Patent JP2011245449
Kind Code:
A
Abstract:

To prevent the degradation of throughput.

A coating apparatus includes: a substrate transfer unit for rotatably retaining a substrate in the erected state, and for arranging the retained substrate at first and second positions; a coating unit with a liquid nozzle for discharging the liquid on each of first and second surfaces of the substrate arranged at the first position; and a removal unit which has a housing mechanism to house a part of the periphery of the substrate arranged at the second position, and a cleaning liquid discharging mechanism for discharging a cleaning liquid on the periphery, and removes the liquid around the periphery.


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Inventors:
SHIMAI FUTOSHI
SATO MASAHIKO
SAHODA TSUTOMU
MARUYAMA KENJI
Application Number:
JP2010123193A
Publication Date:
December 08, 2011
Filing Date:
May 28, 2010
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
B05C11/08; B05C11/10; H01L21/027
Domestic Patent References:
JP2010051899A2010-03-11
JP2004261705A2004-09-24
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi



 
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