Title:
COATING LIQUID FOR FORMING SILICON OXIDE COATING FILM
Document Type and Number:
Japanese Patent JP2739902
Kind Code:
B2
Abstract:
PURPOSE: To obtain a coating liquid having high adhesiveness, denseness and insulation property, free from cracks and useful as an interlaminar insulation film for semiconductor, etc., by dissolving a trialkoxysilane and tetraalkoxysilane, etc., in an organic solvent and hydrolyzing with an acid catalyst.
CONSTITUTION: This coating liquid free from generation of crack even in the form of a thick film, having excellent adhesiveness, denseness, storage stability and insulation property and useful as an interlaminar insulation film for semiconductor element, liquid crystal display element, etc., can be produced by dissolving (A) at least one kind of compound expressed by the formula I (R1 to R3 are 1-4C alkyl or phenyl; 0≤a≤3; 0≤b≤3; 0≤c≤3; a+b+c=3) and (B) at least one kind of compound expressed by the formula II (R4 to R7 are 1-4C alkyl or phenyl; 0≤d≤4; 0≤e≤4; 0≤f≤4; 0≤g≤4; d+e+f+g=4) (e.g. tetraethoxysilane) in (C) an organic solvent (e.g. ethylene glycol dimethyl ether) and hydrolyzing the compounds in the presence of an acid catalyst (e.g. concentrated nitric acid).
Inventors:
Sakamoto Yoshiken
Yoshio Hagiwara
Tanaka Hatsuyuki
Nakayama Hisasa
Yoshio Hagiwara
Tanaka Hatsuyuki
Nakayama Hisasa
Application Number:
JP24405293A
Publication Date:
April 15, 1998
Filing Date:
September 30, 1993
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
C08G77/18; C03C1/00; C08G77/06; C09D183/02; C09D183/04; C09D183/05; (IPC1-7): C09D183/05; C09D183/02
Attorney, Agent or Firm:
Agata Akira (1 person outside)
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