Title:
COBALT COMPOUND, RAW MATERIAL FOR FORMING THIN FILM AND METHOD FOR PRODUCING THIN FILM
Document Type and Number:
Japanese Patent JP2015218116
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide: a cobalt compound which has a low melting point, can be transported in a liquid state, can be decomposed at a low temperature, has a high vapor pressure and can be vaporized readily; and a raw material for forming a thin film using the cobalt compound.SOLUTION: There is provided a method for producing a thin film in which a raw material for forming a thin film containing a cobalt compound represented by the formula (I) (wherein, Rto Reach independently represents a straight or branched chain alkyl group having 1 to 5 carbon atoms) is vaporized to obtain vapor containing cobalt and the cobalt compound represented by the formula (I) is subjected to decomposition and/or chemical reaction by bringing the vapor into contact with a substrate to form a thin film on the substrate.
Inventors:
YOSHINO TOMOHARU
ENZU MASAKI
SAKURAI ATSUSHI
HATASE MASAKO
UCHIOKURA HIROYUKI
NISHIDA AKIHIRO
ENZU MASAKI
SAKURAI ATSUSHI
HATASE MASAKO
UCHIOKURA HIROYUKI
NISHIDA AKIHIRO
Application Number:
JP2014100607A
Publication Date:
December 07, 2015
Filing Date:
May 14, 2014
Export Citation:
Assignee:
ADEKA CORP
International Classes:
C07F15/06; C23C16/40; H01L21/316
Domestic Patent References:
| JP2013216614A | 2013-10-24 |
Foreign References:
| US20130330473A1 | 2013-12-12 |
Attorney, Agent or Firm:
Michiharu Soga
Kajinami order
Kazuhiro Oyaku
Satoshi Iino
Kajinami order
Kazuhiro Oyaku
Satoshi Iino
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