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Patent Searching and Data


Title:
COLD ELECTRON EMISSION ELEMENT AND ITS MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2001357772
Kind Code:
A
Abstract:

To provide a simply processed and inexpensive cold electron emission element and its manufacturing method in which the response of an electron emission from an emitter against a field-effect transistor(FET) is made in a high speed, and suppress dispersions of emitted amount of electrons from each of the emitter in the case emitters are plural.

This consists of a semiconductor layer 2 having grown up on a substrate 1, of an insulating layer and the field-effect transistor(FET), deposited on the growing surface, of one or plural emitters 10 which are obtained by etching either one side region of this FET source or a drain region or the part of semiconductor layer 2 which is adjacent to this region, and of a low resistor layer 15 formed at a lower part of the emitter.


Inventors:
TOTTORI SATORU
NORIKANE TETSUYA
HIRANAKA KOICHI
WADA NAOKI
HORI JUNICHI
Application Number:
JP2000180402A
Publication Date:
December 26, 2001
Filing Date:
June 15, 2000
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
H01J9/02; H01J1/304; (IPC1-7): H01J1/304; H01J9/02
Attorney, Agent or Firm:
Hiroyuki Ikeuchi (5 outside)