To provide a composition for the formation of an inorganic antireflection film with which an antireflection film having a high antireflection effect even in a rather thin film and having excellent adhesion property and sticking property with a resist film can be formed and a resist pattern having excellent resolution and accuracy can be formed.
The composition for the formation of an antireflection film contains at least one kind of tantalum-containing product selected from (A1) the reaction products of (a1) tantalum alkoxide and (a2) at least one kind of compound selected from a group consisting of aminoalcohols, compounds having two or more hydroxyl groups in the molecules (except for aminoalcohols), β-diketones, β-ketoesters, β-dicarboxylates, lactic acid, ethyl lactate, and 1,5- cyclooctadiene and (A2) hydrolyzed products of the above reaction products.
OKADA SACHIKO
YONEKURA ISAMU
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