Title:
COMPOSITION FOR ORGANIC ANTIREFLECTION FILM AND ITS PRODUCTION METHOD
Document Type and Number:
Japanese Patent JP3848551
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a novel polymer for antireflection film, a composition containing the polymer; and a semiconductor element produced by using the composition.
SOLUTION: A polymer represented by formula (1) (wherein Ra and Rb are each H or methyl; R' and R" are each-H,-OH,-OCOCH3,-COOH,-CH2OH, or a 1-6C optionally substituted linear or branched alkyl or alkoxyalkyl group; n is an integer of 1-5; and x and y are each a mol fraction of 0.01-0.99) and a polymer represented by formula (2) (wherein R10 and R11 are each a 1-10C alkoxyalkyl group substituted by a linear or branched chain; and R12 is H or methyl) are provided. The composition for antireflection film contains either of a polymer represented by formula (1) and a polymer represented by formula (2).
Inventors:
Min Ho Yun
Jae Chang Yun
Jun Soo Lee
Kiso Shin
Jae Chang Yun
Jun Soo Lee
Kiso Shin
Application Number:
JP2001283830A
Publication Date:
November 22, 2006
Filing Date:
September 18, 2001
Export Citation:
Assignee:
HYNIX SEMICONDUCTOR INC.
International Classes:
G03F7/11; C08F4/04; C08F4/34; C08F8/00; C08F116/34; C08F212/14; C08F220/06; C08F220/28; C08L25/18; C08L29/00; C08L33/14; C09D125/18; C09D133/14; G03F7/09; H01L21/027; (IPC1-7): C08F212/14; C08F4/04; C08F4/34; C08F8/00; C08F116/34; C08F220/28; C08L25/18; C08L29/00; C08L33/14; C09D125/18; C09D133/14; G03F7/11; H01L21/027
Domestic Patent References:
| JP2000204317A | ||||
| JP2000187325A | ||||
| JP2000187331A |
Foreign References:
| WO1993002146A1 |
Attorney, Agent or Firm:
Kenji Yoshida
Jun Ishida
Jun Ishida
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