Title:
COMPOSITION FOR RESISTING ACNE BACTERIUM
Document Type and Number:
Japanese Patent JP2004189656
Kind Code:
A
Abstract:
To provide a composition for resisting acne bacteria, exhibiting antibacterial properties against the acne bacteria by a proven safe amount.
The composition for resisting the acne bacteria contains cis-6-hexadecenoic acid or a salt thereof, and isopropylmethylphenol or trichlorocarbanilide. The agent for preventing or treating pimples, and the cosmetic contain the cis-6-hexadecenoic acid or the salt thereof, and the isopropylmethylphenol or the trichlorocarbanilide.
Inventors:
YOSHIMATSU TADASHI
TAKIGAWA HIROBUMI
KAWADA YUZO
SANO TOMOHIKO
TAKIGAWA HIROBUMI
KAWADA YUZO
SANO TOMOHIKO
Application Number:
JP2002358345A
Publication Date:
July 08, 2004
Filing Date:
December 10, 2002
Export Citation:
Assignee:
KAO CORP
International Classes:
A61K8/30; A61K8/00; A61K8/33; A61K8/36; A61K8/40; A61K31/05; A61K31/17; A61K31/201; A61P17/10; A61P31/04; A61Q19/00; (IPC1-7): A61K31/05; A61K7/00; A61K7/48; A61K31/17; A61K31/201; A61P17/10; A61P31/04
Domestic Patent References:
| JP2002507198A | 2002-03-05 | |||
| JP2001172176A | 2001-06-26 | |||
| JP2001064150A | 2001-03-13 | |||
| JP2002128631A | 2002-05-09 | |||
| JP2001294753A | 2001-10-23 | |||
| JP2001199872A | 2001-07-24 | |||
| JP2001172159A | 2001-06-26 | |||
| JPH05320023A | 1993-12-03 |
Foreign References:
| US4036991A | 1977-07-19 |
Attorney, Agent or Firm:
Alga Patent Office, a patent business corporation
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