Title:
COMPOSITION
Document Type and Number:
Japanese Patent JP2016089085
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive composition for a thick film, which forms a thick-film photoresist layer and has high heat resistance.SOLUTION: The composition contains, as essential components, an acid generator (A) being a sulfonic acid derivative compound represented by formula (I) and a hindered amine compound (B). (Rto Rare each independently H, a 1-14C alkyl, a 4-18C alkoxy, a 4-18C alkylthio, or the like; and Ris a 1-18C alkyl, a 2-4C acyl, a 6-20C aryl, a 7-20C arylalkyl, or the like.)SELECTED DRAWING: None
Inventors:
YANAGISAWA TOMOHITO
TODA HITOMI
SATO NAOMI
TODA HITOMI
SATO NAOMI
Application Number:
JP2014226861A
Publication Date:
May 23, 2016
Filing Date:
November 07, 2014
Export Citation:
Assignee:
ADEKA CORP
International Classes:
C09K3/00; C07D211/46; C07D221/14; G03F7/004; G03F7/039
Domestic Patent References:
| JPH1152575A | 1999-02-26 | |||
| JP2008249993A | 2008-10-16 |
Attorney, Agent or Firm:
Ichiro Honda
Yumiko Sugimoto
Watari Takumi
Takashi Otaguro
Yumiko Sugimoto
Watari Takumi
Takashi Otaguro