Title:
COMPOUND, RESIN CONTAINING STRUCTURAL UNIT DERIVED THEREFROM, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023047331
Kind Code:
A
Abstract:
To provide a resist composition from which a resist pattern having good line edge roughness can be produced.SOLUTION: The resist composition contains a resin containing a structural unit represented by formula (I) and an acid generator. [In the formula, R0 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; X1 represents *-O-**, *-CO-O-**, *-Ax-Ph-Ay-** or the like; Ph represents an optionally substituted phenylene group; Ax and Ay each represent one bond selected from the group consisting of a single bond, an ether bond, an ester bond and a carbonate ester bond; L1 represents a single bond or an optionally substituted hydrocarbon group; and ring W represents an optionally substituted alicyclic hydrocarbon ring.]SELECTED DRAWING: None
Inventors:
KITA YUJI
AONO YOSHIMASA
ICHIKAWA KOJI
AONO YOSHIMASA
ICHIKAWA KOJI
Application Number:
JP2022149840A
Publication Date:
April 05, 2023
Filing Date:
September 21, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/038; C07D317/72; C07D319/08; C08F20/10; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP