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Patent Searching and Data


Title:
CONDUCTIVE PATTERN AND METHOD OF FORMING THE SAME
Document Type and Number:
Japanese Patent JP2005277213
Kind Code:
A
Abstract:

To provide a high-definition conductive pattern having a superior manufacturing suitability, durability, and conductive stability; and to provide a method of manufacturing a conductive pattern, by which the high-definition conductive pattern can be manufactured by an easy process having a superior manufacturing suitability.

On the front surface of a substrate, a surface grafted material having a grafted polymer chain directly bound to one end by covalent bond, is exposed to light via a photo-cleavable portion. In the exposed region, the photo-cleavable portion is cleaved to remove the grafted polymer chain forming a region, where the grafted polymer chain exists and a region where the grafted polymer chain does not exist. A conductive material is attached to the region, where the grafted polymer chain exists to form the conductive pattern.


Inventors:
KAWAMURA KOICHI
Application Number:
JP2004090152A
Publication Date:
October 06, 2005
Filing Date:
March 25, 2004
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/004; C08F2/00; C23C28/00; G03F7/40; H01L23/12; H05K3/10; H05K3/18; (IPC1-7): H05K3/10; C08F2/00; C23C28/00; G03F7/004; G03F7/40; H01L23/12; H05K3/18
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda