Title:
リソグラフィ投影対物系の補正方法およびリソグラフィ投影対物系
Document Type and Number:
Japanese Patent JP5047544
Kind Code:
B2
Abstract:
The method involves approximately determining a ratio of principal ray height to marginal ray height at an optically operative surface of a mirror (CM) of a projection objective (10). One of optically operative surfaces among lens surfaces of lenses, at which magnitude of a ratio of principal ray height to marginal ray height comes closest to the former ratio, is determined. The mirror is arranged in proximity to a field plane and in proximity to a pupil level of the projection objective. An independent claim is also included for a projection objective of a lithography projection exposure system.
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Inventors:
Wilhelm Ulrich
Thomas Ocon
Norbert Verbra
Toa Alf Gruner
Boris Bitner
Volker Greschose
Thomas Ocon
Norbert Verbra
Toa Alf Gruner
Boris Bitner
Volker Greschose
Application Number:
JP2006179801A
Publication Date:
October 10, 2012
Filing Date:
June 29, 2006
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B13/18; G02B13/24; G02B17/08; G03F7/20
Domestic Patent References:
| JP7005365A | ||||
| JP10284365A | ||||
| JP2001166210A | ||||
| JP2002208551A | ||||
| JP2002258131A | ||||
| JP2002277742A | ||||
| JP2002519843A | ||||
| JP2003535356A | ||||
| JP2004258179A | ||||
| JP2004259844A | ||||
| JP2004317534A | ||||
| JP2004514943A | ||||
| JP2005064310A | ||||
| JP2005129775A | ||||
| JP2005504337A | ||||
| JP2005512151A | ||||
| JP2005536775A | ||||
| JP2007508591A | ||||
| JP2007514192A | ||||
| JP2007516613A |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda