To provide an apparatus that couples two objects so that the vibration of one object does not transmit to the other object.
An exposure apparatus exposes a substrate (P) by filling liquid (50) between a projection optical system (PL) and the substrate (P), and projecting a pattern image onto the substrate (P) via the projection optical system (PL) and the liquid (50). The projection optical system (PL) includes: a first group (60) including an optical member (60) that makes contact with the liquid (50); and a second group (MPL) that differs from the first group (60). The first group (60) is supported by a first support member; and the second group (MPL) is separated from the first group and is supported by a second support member that differs from the first support member.
SHIBAZAKI YUICHI
JPH11288870A | 1999-10-19 | |||
JP2002170765A | 2002-06-14 | |||
JPH06168866A | 1994-06-14 | |||
JPH10303114A | 1998-11-13 | |||
JPH11288870A | 1999-10-19 | |||
JPH10340846A | 1998-12-22 | |||
JP2001343575A | 2001-12-14 | |||
JPS6232613A | 1987-02-12 | |||
JP2002170765A | 2002-06-14 |
WO1999049504A1 | 1999-09-30 | |||
WO2001022480A1 | 2001-03-29 | |||
WO1999049504A1 | 1999-09-30 | |||
WO2001022480A1 | 2001-03-29 |
Tadashi Takahashi
Kazuya Nishi