To provide a covered structure applicable for various fields.
A CVD (chemical vapor deposition) device 10 is provided with an electric furnace 12. In the electric furnace 12, a quartz tube 14 is provided and a heater 16 and a thermocouple 18 are provided around the quartz tube 14. The heater 16 and the thermocouple 18 are connected to a control part which is not illustrated and the control part controls the heater 16 based on the temperature detected by the thermocouple 18 so that the temperature of inside of the quartz tube 14 becomes a predetermined temperature appropriate for growth of a carbon nanotube. On a quartz board 20 set in the quartz tube 14, FeCl3 or a fine wire-like member coated with FeCl3 is loaded as a catalyst. The heater 16 is controlled so that the temperature in the quartz tube 14 becomes 500-800C, for instance, and a gas is fed from an inlet of the quartz tube 14 in an arrow A direction in a figure to drive chemical reaction with the catalyst.
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda