CRUCIBLE FOR CONTINUOUS VACUUM VAPOR DEPOSITION DEVICE

Japanese Patent JP3430543

B2

PURPOSE: To eliminate the fluctuations in evaporation and to enable long-term continuous operation by tilting the crucible housing a molten material for vapor deposition around a tilting shaft at the transverse center of a molten metal surface a molten metal level height, thereby discharging and removing the impurities on the molten metal surface.
CONSTITUTION: The material 5 for vapor deposition is heated to melt by irradiating the material with an electron beam 4 while the material 11 is supplied from a supplying device 8 in a vacuum, by which the material is evaporated and the film thereof is formed on the surface of a traveling substrate (not shown in Fig.). This crucible 6 for the continuous vacuum vapor deposition is provided with the crucible tilting shaft nearly at the center of the molten metal surface at the molten metal level height and is thereby made tiltable at its axial center as a center 32. As a result, the impurities 14 on the molten metal surface are discharged from the crucible end in the lower part by properly tilting the crucible 6 to the right or left. The change in the irradiated part 13 at the time of the tilting is prevented by preferably aligning the irradiation center of the electron beam 4 to the axial center mentioned above, by which the fluctuation in the film thickness is eliminated. Both sides of the tilting center 32 are preferably provided with skimmers 25a, 25b which are preferably constituted to move clown to the position not in contact with the molten metal surface cooperatively with the tilting of the crucible 6.

Kiyoshi Nehashi

JP4420893A

July 28, 2003

March 05, 1993

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Ishikawajima Harima Heavy Industries Co., Ltd.

C23C14/24; C23C14/30; C23C14/56; (IPC1-7): C23C14/30; C23C14/24

JP222462A
JP60162772A
JP3134159A
JP59190360A
JP59177368A

Minoru Hotta (2 outside)

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