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Title:
CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN
Document Type and Number:
Japanese Patent JP2011124554
Kind Code:
A
Abstract:

To provide a curable composition for nano-imprints, which exhibits good patternability in repeated pattern transferring and solvent resistance of a pattern having been cured.

The curable composition for imprints contains (A) polymerizable compounds and (B) a photoinitiator, the polymerizable compounds being (Al) a polymerizable compound having at least one of a fluorine atom and a silicon atom and (A2) a polymerizable compound having an aromatic group.


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Inventors:
KODAMA KUNIHIKO
Application Number:
JP2010248136A
Publication Date:
June 23, 2011
Filing Date:
November 05, 2010
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
B29C59/02; H01L21/027; C08F220/10; C08F230/08; B29K27/12; B29K83/00
Domestic Patent References:
JP2009214323A2009-09-24
JP2006114882A2006-04-27
JP2009203287A2009-09-10
JP2006516065A2006-06-15
JP2007307899A2007-11-29
JP2008095037A2008-04-24
JP2009215179A2009-09-24
JP2009214419A2009-09-24
JP2009206196A2009-09-10
JP2009218550A2009-09-24
JP2006114882A2006-04-27
JP2009203287A2009-09-10
JP2009214323A2009-09-24
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes



 
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