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Patent Searching and Data


Title:
CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN
Document Type and Number:
Japanese Patent JP2011124554
Kind Code:
A
Abstract:

To provide a curable composition for nano-imprints, which exhibits good patternability in repeated pattern transferring and solvent resistance of a pattern having been cured.

The curable composition for imprints contains (A) polymerizable compounds and (B) a photoinitiator, the polymerizable compounds being (Al) a polymerizable compound having at least one of a fluorine atom and a silicon atom and (A2) a polymerizable compound having an aromatic group.


Inventors:
Kodama, Kunihiko
Application Number:
JP2010000248136
Publication Date:
June 23, 2011
Filing Date:
November 05, 2010
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
H01L21/027; B29C59/02; C08F220/10; C08F230/08; B29K27/12; B29K83/00
Domestic Patent References:
2009-09-24
2006-04-27
2009-09-10
2006-06-15
2007-11-29
2008-04-24
2009-09-24