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Title:
DECOMPOSING TREATING FACILITY FOR PERSISTENT HALOGEN COMPOUND
Document Type and Number:
Japanese Patent JP2003035044
Kind Code:
A
Abstract:

To provide a decomposing treating facility for an persistent halogen compound preventing an extension to external environment ( a non-management zone) of the pollution of the halogen compound and being capable of safely decomposing and treating the halogen compound even when the persistent halogen compound such as PCB leaks out.

In the decomposing treating facility for the persistent halogen compound with a receiving facility, in which the halogen compound or the like is received and stored, a decomposition reaction facility, a reaction exhaust gas treating facility and a post processing facility, the receiving facility and the decomposition reaction facility are installed in the first management zone having a structure isolated from the outside, the reaction exhaust gas treating facility in the second management zone having a structure capable of being isolated from the outside when the halogen compound leaks out and the post processing facility in the non-management zone respectively.


Inventors:
SASAGAWA YUKIO
ARIIZUMI AKIRA
OTSUKA TETSUO
Application Number:
JP2001222045A
Publication Date:
February 07, 2003
Filing Date:
July 23, 2001
Export Citation:
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Assignee:
NIPPON SODA CO
International Classes:
E04H5/02; A62D3/30; A62D3/34; A62D3/36; A62D3/37; B01J19/00; C07B35/06; C07B37/06; C07C25/18; C07D319/24; A62D101/04; A62D101/22; A62D101/28; (IPC1-7): E04H5/02; A62D3/00; B01J19/00; C07B35/06; C07B37/06; C07C25/18
Domestic Patent References:
JPS61175424A1986-08-07
Attorney, Agent or Firm:
Haruhito Oishi