DEPOSITION METHOD OF SOLUTE AND DEVICE - COMMISSARIAT ENERGIE ATOMIQUE

Title:

DEPOSITION METHOD OF SOLUTE AND DEVICE

Document Type and Number:

Japanese Patent JP2014031584

Kind Code:

A

Abstract:

To provide a method capable of obtaining suitable particle size distribution of deposits by preventing accumulation caused by attachment of the deposits to a wall part of a device, and continuously discharging the deposits by controlling flow characteristic in a deposition device and flow rate characteristic through the deposition device.

A deposition device contains a circulation reverse to an entrapping phase (10 to 9) of chemically inactive organic products not having miscibility with reactants (8, 6, 7 to 42) and retains a phase containing a liquid chemical in a cloudy insoluble solution. A wall part of the deposition device is made hydrophobic and prevents attachment of deposits. The cloudy insoluble solution is maintained by an operable agitation device body (2). Deposits are discharged by a liquid discharging flow rate device (16) continuously.

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Inventors:

BORDA GILLES
JEAN DUHAMET
FLORENT GANDI
LANOE JEAN-YVES

Application Number:

JP2013183973A

Publication Date:

February 20, 2014

Filing Date:

September 05, 2013

Export Citation:

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Assignee:

COMMISSARIAT ENERGIE ATOMIQUE

International Classes:

C22B60/04; C01B21/06; G21F9/10

Domestic Patent References:

JP2010501735A	2010-01-21
JPH05200260A	1993-08-10
JPH05212206A	1993-08-24
JPS3515567B1

Attorney, Agent or Firm:

Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro

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