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Title:
DEPOSITION METHOD OF SOLUTE AND DEVICE
Document Type and Number:
Japanese Patent JP2014031584
Kind Code:
A
Abstract:

To provide a method capable of obtaining suitable particle size distribution of deposits by preventing accumulation caused by attachment of the deposits to a wall part of a device, and continuously discharging the deposits by controlling flow characteristic in a deposition device and flow rate characteristic through the deposition device.

A deposition device contains a circulation reverse to an entrapping phase (10 to 9) of chemically inactive organic products not having miscibility with reactants (8, 6, 7 to 42) and retains a phase containing a liquid chemical in a cloudy insoluble solution. A wall part of the deposition device is made hydrophobic and prevents attachment of deposits. The cloudy insoluble solution is maintained by an operable agitation device body (2). Deposits are discharged by a liquid discharging flow rate device (16) continuously.


Inventors:
Borda, Gilles
Jean, Duhamet
Florent, Gandi
Lanoe, Jean-yves
Application Number:
JP2013000183973
Publication Date:
February 20, 2014
Filing Date:
September 05, 2013
Export Citation:
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Assignee:
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
International Classes:
C22B60/04; C01B21/06; G21F9/10
Domestic Patent References:
JPH05200260A1993-08-10
JPH05212206A1993-08-24
JPS3515567B1
JP2010501735A2010-01-21
Attorney, Agent or Firm:
村山 靖彦
志賀 正武
渡邊 隆
実広 信哉



 
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