DETERGENT COMPOSITION CONTAINING NUCLEOPHILIC AMINE COMPOUND HAVING REDUCTION AND OXIDATION POTENTIAL AND WASHING METHOD FOR SUBSTRATE BY USE OF THIS

Japanese Patent JP3150306

B2

PROBLEM TO BE SOLVED: To effectively remove both a resist and an etching residue by containing a specified nucleophilic amine compound having reduction and oxidation potential, an organic solvent compatible with the nucleophilic amine compound, and water.
SOLUTION: This detergent composition contains about 5 - about 50 wt.% of at least one nucleophilic amine compound having reduction and oxidation potential selected from the group consisting of compounds shown by formula I and hydrazine shown by formula II, about 10 - about 80 wt.% of at least one organic solvent compatible with the nucleophilic amine compound, and water present in a sufficient quantity to remove a resist and an etching residue from a substrate by the nucleophilic amine compound and the organic solvent. In formula I, R5-R7 each represent independently hydrogen, a hydroxyl group or the like, or a salt or derivative thereof, and all of them are never simultaneously hydrogen. In formula II, R11-R14 each represent independently hydrogen, a hydroxyl group or the like, or a salt thereof, and all of them are never simultaneously hydrogen.

Yi Moon Lee
Charles You Pitman Junior
Robert Juie Small

JP23790498A

March 26, 2001

July 21, 1998

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E.K.C.Technology Inc.

C11D7/60; B24B37/04; C09D9/00; C11D3/20; C11D3/30; C11D3/34; C11D3/43; C11D7/26; C11D7/32; C11D7/34; C11D7/50; C11D11/00; C23G1/10; C23G1/20; G03F7/32; G03F7/42; H01L21/02; H01L21/027; H01L21/30; H01L21/304; H01L21/308; H01L21/311; H01L21/321; H01L21/3213; H01L21/768; H01L21/306; (IPC1-7): G03F7/32; H01L21/304

JP63183445A
JP1105949A
JP6295531A
JP6249355A
JP6424254A

【文献】欧州特許出願公開485161(EP,A1)

Eiji Katayama (1 person outside)

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