Title:
DEVELOPER COMPOSITION AND DEVELOPING METHOD
Document Type and Number:
Japanese Patent JP3225101
Kind Code:
B2
Abstract:
PURPOSE: To provide the resist developer compsn. which does not corrode the oxidized films of a multilayered film substrate having the oxidized films and amphoteric metallic films and the developing method using such compsn.
CONSTITUTION: A transparent electrode consisting of an ITO film 2 is formed on a glass substrate 1 and an aluminum film 6 is formed in a part of this transparent electrode. A positive resist coating film 7 is applied on this aluminum film 6 and after the film is dried, the film is exposed with UV rays and thereafter the unnecessary resist coating film 7 is removed by the developer contg. peroxide. Further, the aluminum film 6 is processed by etching and thereafter, the resist coating film 7 is removed by a peeling agent, by which the patterns are completed.
Inventors:
Kiyoji Uchikawa
Hiroshi Komano
Hiroshi Komano
Application Number:
JP20969192A
Publication Date:
November 05, 2001
Filing Date:
July 14, 1992
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/26; G03F7/11; G03F7/32; H01L21/027; H01L21/30; (IPC1-7): G03F7/32; G03F7/11; G03F7/26; H01L21/027
Domestic Patent References:
| JP1307280A | ||||
| JP3240220A | ||||
| JP63116427A | ||||
| JP511458A | ||||
| JP57500530A |
Attorney, Agent or Firm:
Tomiho Inamoto (3 outside)