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Title:
DEVELOPING METHOD FOR IMMERSION LITHOGRAPHY, SOLVENT USED FOR THE DEVELOPING METHOD, AND ELECTRONIC DEVICE USING THE DEVELOPING METHOD
Document Type and Number:
Japanese Patent JP2010034485
Kind Code:
A
Abstract:

To provide a developing method for immersion lithography for obtaining an electronic device that eliminates a development defect, achieving a process that is simple and reduced cost and enables high repellency sufficient to allow high-speed scanning, and to provide the developing method for immersion lithography by a developing method improved by inexpensive material without introducing any new facility.

The developing method for immersion lithography of an electronic device including the step of development with alkali immersion is characterized by a dissolving and removing step ST5-6, conducted using a dissolving and removing solution that selectively dissolves and removes a surface segregation agent of a resist containing the surface segregation agent and chemically-amplified resist.


Inventors:
TERAI MAMORU
HAGIWARA TAKUYA
ISHIBASHI TAKEO
Application Number:
JP2008239110A
Publication Date:
February 12, 2010
Filing Date:
September 18, 2008
Export Citation:
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Assignee:
RENESAS TECH CORP
International Classes:
H01L21/027; G03F7/30; G03F7/38
Domestic Patent References:
JP2008260931A2008-10-30
JP2008309257A2008-12-25
JP2008112123A2008-05-15
JP2007148167A2007-06-14
JP2006309245A2006-11-09
JP2007241270A2007-09-20
JP2007219152A2007-08-30
JP2008032758A2008-02-14
JP2008260931A2008-10-30
JP2008309257A2008-12-25
JP2008112123A2008-05-15
JP2007148167A2007-06-14
JP2006309245A2006-11-09
Attorney, Agent or Firm:
Kuro Fukami
Toshio Morita
Yoshihei Nakamura
Yutaka Horii
Hisato Noda
Masayuki Sakai
Nobuo Arakawa



 
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