To provide a development device and a substrate treatment method which can eliminate defects on a photosensitive film readily and effectively in a short time.

Waiting pots 6, 7 are disposed in both sides of an outer cup 5 respectively, and a guide rail 8 is disposed at one side of the outer cup 5. A developer nozzle arm 9 is provided movably in a scanning direction A and its reverse direction along the guide rail 8 by means of an arm driving part 10. A rinse liquid discharge nozzle 16 is disposed rotatively in a direction of an arrow Q in a side of the other side of the outer cup 5. A CCD(Charge Couple Device) camera 20 for appearance inspection of a substrate surface is arranged in an upper side of the other side of the outer cup 5. The CCD camera 20 is supported by a camera supporting rail 21.