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Title:
DEVICE AND METHOD FOR DRYING AND WASHING SUBSTRATE
Document Type and Number:
Japanese Patent JP2001053051
Kind Code:
A
Abstract:

To dry a substrate to a clean state without generating a water mark, contamination, or the like on a surface by moving a nozzle in parallel with the surface of a substrate to be dried, and at the same time in the radial direction from the center of the substrate to be dried to an outer periphery.

A demineralized water nozzle 33 and an inert gas injection nozzle 43 are slantingly mounted so that the injection directions of nozzles oppose each other, and the inert gas injection nozzle 43 and the demineralized water nozzle 33 are positioned at the center and outer-periphery sides of a substrate 2, respectively. In the inert gas injection nozzle, an inert gas introduction pipe 45 is provided, an inert gas being introduced from the inert gas introduction pipe is jetted out of an injection port 46 at a lower end, thus eliminating a demineralized water film 14 on the surface of the substrate 2 in a concentric circle shape from nearly the center of the substrate to an outer periphery for forming a drying region 13. Then, a support rod 31 can be rotated around the vertical center shaft, and is rotated by a motor.


Inventors:
FUJITA TAKUMI
SHIBA KAZUHIKO
Application Number:
JP22622699A
Publication Date:
February 23, 2001
Filing Date:
August 10, 1999
Export Citation:
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Assignee:
PRE TECH CO LTD
International Classes:
B08B3/02; B08B3/08; B08B3/12; F26B21/00; H01L21/304; (IPC1-7): H01L21/304; B08B3/02; B08B3/08; B08B3/12; H01L21/304
Attorney, Agent or Firm:
Mikio Yoshimiya