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Title:
DEVICE AND METHOD FOR SUPPLYING PROCESSING LIQUID
Document Type and Number:
Japanese Patent JP2015088702
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a technique capable of collecting foreign substances in a processing liquid at a high collection rate.SOLUTION: At discharging from a nozzle 7 a processing liquid from a processing liquid vessel 60, the secondary side of a pump 70 is connected to the primary side of a filter 52, so that a resist liquid L passing through the filter 52 is returned to the supply source side, and the returned processing liquid is synthesized with a processing liquid supplemented from the processing liquid vessel 60. In at least one of the case when returning the processing liquid to a buffer tank 61 and the case when sucking the synthesized resist liquid L into the pump 70, it is made to pass through the filter 52. This enables collection of foreign substances in the processing liquid at a high collection rate, while suppressing the number of filters 52, for example, using one filter 52.

Inventors:
YOSHIHARA KOSUKE
TAKAYANAGI YASUHARU
KOSHO TOMONOBU
SASA TAKUSHI
ISHIMARU DAISUKE
Application Number:
JP2013228580A
Publication Date:
May 07, 2015
Filing Date:
November 01, 2013
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/027; B05C11/10; B05D1/26; B05D3/00; G02F1/13
Domestic Patent References:
JP2007035733A2007-02-08
JPH02298381A1990-12-10
JP2001269608A2001-10-02
JP2002273113A2002-09-24
JP2011238666A2011-11-24
JP2011101851A2011-05-26
JP2013191843A2013-09-26
JP2000120530A2000-04-25
Foreign References:
WO2006057345A12006-06-01
Attorney, Agent or Firm:
Toshio Inoue
Nobuaki Takizawa