Title:
複数の荷電粒子ビームを使用する装置
Document Type and Number:
Japanese Patent JP7148692
Kind Code:
B2
Abstract:
The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.
Inventors:
Ren, Weimin
Riu, Shuedon
Phu, Shwelan
Chen, Zhong Wei
Riu, Shuedon
Phu, Shwelan
Chen, Zhong Wei
Application Number:
JP2021150383A
Publication Date:
October 05, 2022
Filing Date:
September 15, 2021
Export Citation:
Assignee:
ASM L Netherlands B.V.
International Classes:
H01J37/141; H01J37/09; H01J37/145; H01J37/244
Domestic Patent References:
| JP2007110087A | ||||
| JP2002319532A |
Foreign References:
| US20160268096 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
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