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Patent Searching and Data


Title:
DIAZO COMPOUND, PHOTOSENSITIVE LITHOGRAPHIC PRINTING MATRIX USING THE SAME AND METHOD FOR DEVELOPING THE PRINTING MATRIX
Document Type and Number:
Japanese Patent JPH0859589
Kind Code:
A
Abstract:

PURPOSE: To obtain a diazo compound useful for e.g. photosensitive lithographic printing matrices high in plate wear, free from print stain, excellent in developability and having wide pH latitude.

CONSTITUTION: This diazo compound is such that an aromatic secondary amino compound having group of formula I (X is a counter anion of diazonium) has been added in a ring-opened fashion to the oxirane ring of a polyfunctional epoxy compound (e.g. bisphenol A digiycidyl ether). This compound is obtained, for example, by the following process: a ring-opening addition reaction is made between (A) a polyfunctional epoxy compound and (B) an aromatic secondary amino compound having substituent (pref. acylamido, nitro) convertible into amino group, and the substituent convertible into amino group on the reaction product is converted into amino group which is, in turn, converted into diazonium salt. Alternatively, this compound can also be obtained by polyaddition reaction between a diisocyanate compound and a diol of formula II (R1 and R2 are each a single bond or alkylene).


Inventors:
KONUMA TOMOHITO
MATSUMURA TOMOYUKI
OTA TOMOHISA
MURATA MASAHISA
TSUJI SHIGEO
Application Number:
JP21431294A
Publication Date:
March 05, 1996
Filing Date:
August 17, 1994
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
MITSUBISHI CHEM CORP
International Classes:
G03F7/016; C07C245/20; G03F7/00; G03F7/021; G03F7/30; (IPC1-7): C07C245/20; G03F7/00; G03F7/016; G03F7/021; G03F7/30
Attorney, Agent or Firm:
Yoshio Iwama