Title:
DRESSING DEVICE OF POLISHING PAD AND POLISHING DEVICE WITH DRESSING DEVICE
Document Type and Number:
Japanese Patent JP2003170346
Kind Code:
A
Abstract:
To provide a dressing device free to carry out dressing capable of changing a local important position on a polishing pad.
This dressing device 30 of the polishing pad on a polishing device polishes a work by making it contact with the polishing pad while supplying slurry and has a disc type pad dresser arranged on the polishing pad and free to rotate, and a surface of a face to make contact with the polishing pad of the pad dresser 22 is recessed or protruded.
Inventors:
FUJITA TAKASHI
Application Number:
JP2001371204A
Publication Date:
June 17, 2003
Filing Date:
December 05, 2001
Export Citation:
Assignee:
TOKYO SEIMITSU CO LTD
International Classes:
B24B53/017; B24B53/02; B24B53/12; H01L21/304; (IPC1-7): B24B37/00; B24B53/02; B24B53/12; H01L21/304
Attorney, Agent or Firm:
Kenzo Matsuura