To provide an edge polishing device and an edge polishing method capable of enhancing a polishing speed without generating vibration and waving and decreasing a surface roughness of a polishing surface after polishing by using a polishing pad having a specific multi-layer structure.

The polishing pad 12 comprising a first layer forming a polishing surface and a second layer for supporting the first layer is adhered on a flat surface plate 11 of the edge polishing device. The first layer is a sheet 121 comprising at least one of synthetic resin foam, a resin processing article of unwoven fabric, synthetic leather or a composite article of these. The second layer is a sheet 122 comprising a rubber-like elastic body having compression modulus of elasticity in a range of 200-500 kgf/cm2 and thickness of 0.5-2mm. A ratio (H2/H1) of hardness (H2) of the sheet of the second layer and hardness (H1) of the sheet forming the first layer is 0.8-1.6.