PURPOSE: To obtain an electron beam drawing device which is capable of drawing a pattern high in accuracy at a high speed and enhanced in processing accuracy.

CONSTITUTION: A section which corrects an electron beam on a focus and astigmatism at a high speed and another section which corrects an electron beam on a focus and astigmatism at a comparatively low speed are separated and allotted to an electrostatic corrector and an electromagnetic corrector respectively. For instance, the variation of a work 11 in height is detected through a specimen height detector 13, and the work 11 is corrected in height with a electromagnetic focus corrector 10 through a height control 14. A focus correction attendant on deflection is made through an electrostatic focus corrector 9 by a deflection output from a deflection control device 15.