Title:
ELECTRON BEAM EXPOSURE SYSTEM AND ITS OPERATING METHOD
Document Type and Number:
Japanese Patent JP3738393
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve the throughput of an electron beam exposure system and its operating method by shortening the time required for deflection and exposure without degrading the exposing accuracy when the deflection by a main deflector is transferred to a region in which exposure is possible by a sub-deflector at a high speed by using a feedback deflector.
SOLUTION: The election beam exposure system, comprising a main deflection settling feedback circuit for extracting a difference between an output of a D-A converter for converting the amount of deflection of the main deflector from digital to analog and a voltage applied to the main deflector and deflecting the position of the electron beam to the position at which exposure is possible by the sub-deflector based on the extracted output, is provided with a main deflector settling wait time control section.
Inventors:
Seto Isamu
Kenichi Miyazawa
Hiroshi Yasuda
Soichiro Arai
Hidefumi Yahara
Kenichi Miyazawa
Hiroshi Yasuda
Soichiro Arai
Hidefumi Yahara
Application Number:
JP2003336753A
Publication Date:
January 25, 2006
Filing Date:
September 29, 2003
Export Citation:
Assignee:
富士通株式会社
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP63239816A | ||||
| JP4273429A | ||||
| JP5062890A | ||||
| JP6053129A | ||||
| JP6275499A |
Attorney, Agent or Firm:
Manabe Kiyoshi
Shoji Kashiwaya
Koichi Watanabe
Toshiro Ito
Shoji Kashiwaya
Koichi Watanabe
Toshiro Ito