Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ELECTRON BEAM HEATING VAPOR DEPOSITION METHOD AND APPARATUS THEREOF
Document Type and Number:
Japanese Patent JPH08225932
Kind Code:
A
Abstract:

PURPOSE: To attain an electron beam beating vapor deposition execellent in the productivity and the repeatability by filling a vaporizing material into a loop-like hearth and returning this loop-like hearth to the irradiating position of a beam spot of the electron beam.

CONSTITUTION: The vaporizing material 41 is filled into the whole periphery of an annular hearth 33 (hearth block 31). The electron beam having small energy spot-irradiates the vaporizing material 41 to execute the blowoff of gas. Successively, the intensity of the electron beam is raised to start the vapor deposition and also, the annular hearth 33 is rotated at the fixed speed. The vaporization is caused at the beam spot part (S/e part) by starting the vaporization to form a vaporized groove 41a. When the tip part of the vaporized groove 41a reaches a guide 23, the vapor deposition materiall 41 is supplied to the guide member 23, and the vapor deposition material 4 in a pot 17 is replenished by the consumed quantity into the vaporized groove 41a.


Inventors:
KIKUCHI KAZUO
ZAISHO SHINICHIRO
ENDO KAZUHIRO
Application Number:
JP5196295A
Publication Date:
September 03, 1996
Filing Date:
February 16, 1995
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SHINCRON KK
International Classes:
C23C14/24; C23C14/30; C23C14/56; (IPC1-7): C23C14/30; C23C14/24; C23C14/56
Attorney, Agent or Firm:
Fumio Usmura