Title:
ELECTRON BEAM SCANNING APPARATUS
Document Type and Number:
Japanese Patent JP3266336
Kind Code:
B2
Abstract:
PURPOSE: To compensate that the S/N of the title apparatus is worsened when reflected electrons plunge by a method wherein a punched mask in which the axis of an electron beam coincides with the center of an opening and which has a prescribed inside diameter is arranged in a prescribed position which is situated between the surface of a specimen and a detection face and which is calculated from the distance between the surface of the specimen and the detection face and from the size of the detection face.
CONSTITUTION: Detectors 13, 14 which have been installed near exits of electron beams 10, 12 capture reflected electrons or secondary electrons at each electron beam on detection faces having a prescribed area. They output electric signals which are proportional to their captured amounts. At this time, a punched mask 15 is arranged between the detectors 13, 14 and a specimen 12. Circular holes corresponding to the number of electron beams are formed in the punched mask; the center of each circular hole coincides with the axis of each electron beam. Reflected electron 18 from the adjacent electron beams are shielded by a non-opening part in the punched mask 15. Consequently, it is possible to positively avoid that the reflected electrons plunge from an adjacent irradiation region.
Inventors:
Hiroshi Tanaka
Ichiro Honjo
Ichiro Honjo
Application Number:
JP29590792A
Publication Date:
March 18, 2002
Filing Date:
November 05, 1992
Export Citation:
Assignee:
富士通株式会社
International Classes:
G01R31/302; H01J37/305; H01L21/027; G01B15/00; (IPC1-7): H01L21/027; G01B15/00; G01R31/302; H01J37/305
Domestic Patent References:
| JP5148975A | ||||
| JP5776837A | ||||
| JP59184524A | ||||
| JP6119126A | ||||
| JP63269007A | ||||
| JP63269525A | ||||
| JP1248517A |
Attorney, Agent or Firm:
Gunichiro Ariga