ELECTRONIC MATERIAL SUBSTRATE CLEANING LIQUID

Title:

ELECTRONIC MATERIAL SUBSTRATE CLEANING LIQUID

Document Type and Number:

Japanese Patent JP2017050039

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide an electronic material substrate cleaning liquid capable of reducing cleaning residues, such as particles and organic matter, remaining on a substrate after cleaning, and providing a high level of cleanliness required by increasingly higher recording density.SOLUTION: An electronic material substrate cleaning liquid contains a water-soluble amine (A), exhibits pH of 10.5-11.6 at 25°C, and satisfies a conditional expression (1): (water-soluble amine concentration+0.61)/(pH of the cleaning liquid)≥0.059 ...(1), where the water-soluble amine concentration refers to water-soluble amine (A) content (wt.%) with respect to a weight of the cleaning liquid.SELECTED DRAWING: None

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Inventors:

SATO SHOHEI

Application Number:

JP2016154151A

Publication Date:

March 09, 2017

Filing Date:

August 05, 2016

Export Citation:

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Assignee:

SANYO CHEMICAL IND LTD

International Classes:

G11B5/84; B08B1/04; B08B7/04; C11D3/20; C11D3/30; C11D3/36; C11D7/32; C11D17/08

Domestic Patent References:

JP2015063677A	2015-04-09
JP2010170615A	2010-08-05
JP2011227984A	2011-11-10
JP2014141669A	2014-08-07
JP2014141668A	2014-08-07

Foreign References:

WO2016208412A1

2016-12-29

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