ELECTROSTATIC CHUCK - NIPPON ENG KK

Title:

ELECTROSTATIC CHUCK

Document Type and Number:

Japanese Patent JP2000306986

Kind Code:

A

Abstract:

To obtain an electrostatic chuck that can increase the plasma- resistance property of an electrostatic chuck base, without damaging attraction force by the Johnson-Rahbek effect, can suppress generation of impurity elements that become the contamination source for a body to be attracted and generation leakage current accompanying reduction of resistivity, and can be used over a wide temperature range.

A plasma-resistant protection film 2, consisting of a low-impurity dielectric, is provided onto the surface of an electrostatic chuck base 3 made of one of ceramics, silicone resin, and polyimide. Furthermore, more specifically, on the surface of a ceramics sintering body 3 having resistivity of 1010-1015 Ωcm, an aluminum nitride film 2 formed by the gaseous phase synthesis method is provided. Also, the aluminum nitride film 2 preferably contains titanium with a ratio of 10 atom.% or less with respect to aluminum element.

Inventors:

KANEKO KAZUO
KANEKO KAYU
MORIKAWA SHIGERU
FUJII TAKAMITSU
KAJIMURA ATSUKO

Application Number:

JP11029499A

Publication Date:

November 02, 2000

Filing Date:

April 19, 1999

Export Citation:

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Assignee:

NIPPON ENG KK
KANSAI RES INST

International Classes:

H01L21/302; H01L21/3065; H01L21/68; H01L21/683; H02N13/00; (IPC1-7): H01L21/68; H01L21/3065; H02N13/00

Attorney, Agent or Firm:

Shuichiro Kitamura

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