ESTER COMPOUND AND METHOD FOR PRODUCING THE SAME, MACROMOLECULAR COMPOUND, RESIST MATERIAL, AND METHOD OF PATTERN FORMATION

Japanese Patent JP2008031160

A

To provide new ester compounds each as a monomer of a macromolecular compound for a base resin of a chemical amplification-type resist material suitable for the fine processing technology, and to provide methods for producing the ester compounds respectively, to provide the macromolecular compound with each of the ester compounds as the monomer, and to provide such a resist material comprising the macromolecular compound as the base resin.

Four kinds of the ester compounds are represented by the respective formulas in the Figure A. The methods for producing the ester compounds are represented by the formulas in the Figures B and C, respectively. The macromolecular compound with each of the ester compounds as the monomer is provided. The resist material comprising the macromolecular compound as the base resin is also provided.

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JP2005255583	METHOD FOR PRODUCING CYCLIC SKELETON-CONTAINING (METH)ACRYLIC ACID ESTER
WO/2007/105989	1-OXO-3-(1H-INDOLE)-3-IL-1,2,3,4-TETRAHYDROISOXYNOLINES, METHODS FOR THE PRODUCTION THEREOF, COMBINATORIC LIBRARY AND FOCUSED LIBRARY

OHASHI MASAKI
KANOU TAKESHI
WATANABE TAKESHI

JP2007170036A

February 14, 2008

June 28, 2007

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SHINETSU CHEMICAL CO

C07D307/00; C07D307/94; C07D311/96; C07D493/18; C08F20/28; C08F222/06; C08F232/04; G03F7/039

JP2005350527A	2005-12-22
JP2005325293A	2005-11-24

Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa

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