Title:
EXCESSIVE WIRE LENGTH ABSORBING DEVICE AND POWER FEEDING DEVICE FOR SLIDE DOOR USING THE SAME
Document Type and Number:
Japanese Patent JP3940309
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To compactly, smoothly and surely absorb the excessive length of a wire.
SOLUTION: This excessive wire length absorbing device 1 employed in this application is provided with a case 2 having wire lad-out parts 51 and 52, a wire winding reel circumferentially rotatably installed in the case, and an energizing member for energizing the reel, and the case 2 is circumferentially rotatably supported on the mounting side. A rotation shaft 50 is mounted to the case 2, and a receiving part for the rotation shaft is formed on the mounting side. The rotation center of the reel is positioned concentrically with that of the case 2. In this power feeding device 41 employed in this application, the absorbing device 1 is circumferentially rotatably installed on a slide door 40 or a vehicle body 42, a movable-side wire 3a is disposed on either side of the vehicle body 42 and the slide door 40, and a fixed-side wire 3b is disposed on the other side thereof. The wire may be nearly horizontally led out from the lead-out part 51 by transversely disposing the absorbing device 1.
More Like This:
JP5636992 | Vehicle display device |
JP2005324613 | GROMMET |
Inventors:
Yasuhiro Suzuki
Sano Satoru
Sano Satoru
Application Number:
JP2002094938A
Publication Date:
July 04, 2007
Filing Date:
March 29, 2002
Export Citation:
Assignee:
Yazaki Corporation
International Classes:
B60R16/02; H01R13/46; H01R39/00; (IPC1-7): H01R13/46; B60R16/02; H01R39/00
Domestic Patent References:
JP5115396A | ||||
JP10278588A | ||||
JP2001114476A | ||||
JP2001145244A | ||||
JP10181472A | ||||
JP11026131A |
Attorney, Agent or Firm:
Hideo Takino
Hiroshi Ochi
Sadao Matsumura
Isamu Kakiuchi
Hiroshi Ochi
Sadao Matsumura
Isamu Kakiuchi
Previous Patent: HARNESS FIXTURE
Next Patent: METHOD AND APPARATUS FOR PLOTTING ELECTRON BEAM AND SEMICONDUCTOR-MANUFACTURING METHOD USING THEM
Next Patent: METHOD AND APPARATUS FOR PLOTTING ELECTRON BEAM AND SEMICONDUCTOR-MANUFACTURING METHOD USING THEM