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Title:
EXHAUST GAS TREATMENT DEVICE FOR ORGANIC COMPOUND DECOMPOSITION TREATMENT FACILITY
Document Type and Number:
Japanese Patent JP2003194479
Kind Code:
A
Abstract:

To appropriately maintain the internal pressure of a thermal decomposition furnace and to prevent back fire from a combustor in an exhaust gas treatment device for an organic compound decomposition treatment facility wherein exhaust gas produced by the thermal decomposition of an organic compound in a thermal decomposition furnace is burnt in the combustor.

The exhaust gas from the thermal decomposition furnace 1 is sucked by an ejector 3 using water as a driving fluid. On the basis of a detection signal of a pressure detector 26 for detecting the internal pressure of the furnace, the rotating speed of a water pump 20 for supplying the driving fluid to the ejector 3 is changed to adjust the suction quantity of gas, thus maintaining the internal pressure of the furnace within a fixed range. The exhaust gas is exhausted together with the driving fluid (water) of the ejector 3 to the combustor 5 side to prevent back fire from the gas combustor 5.


Inventors:
KIDA KIYONORI
OKAYAMA SAKAE
TADANO HIDEAKI
MATSUSHITA MASANORI
Application Number:
JP2001397333A
Publication Date:
July 09, 2003
Filing Date:
December 27, 2001
Export Citation:
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Assignee:
FUJI ELECTRIC CO LTD
International Classes:
B09B3/00; F23G5/16; F23G5/50; F23G7/06; F27D17/00; F23G5/027; (IPC1-7): F27D17/00; B09B3/00; F23G5/027; F23G5/16; F23G5/50; F23G7/06
Attorney, Agent or Firm:
Iwao Yamaguchi (2 people outside)