Title:
EXPOSURE APPARATUS AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2011169924
Kind Code:
A
Abstract:
To provide exposure apparatus and an exposure method which achieve shorting of a mask replacement time (apparatus down time) and highly accurate exposure by simple constitution by using a comparatively inexpensive film mask.
The exposure apparatus irradiates a workpiece W with a light beam of exposure light from an illumination optical system 160 through a mask M, and transfers a pattern Pa of the mask M to the workpiece W. The mask M is equipped with: a film mask 120 on which the pattern Pa is formed; and a glass plate 122 onto which the film mask 120 is stuck.
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Inventors:
KISHIDA MANABU
KARUISHI SHUSAKU
KARUISHI SHUSAKU
Application Number:
JP2010021412A
Publication Date:
September 01, 2011
Filing Date:
February 02, 2010
Export Citation:
Assignee:
NSK LTD
International Classes:
G03F7/20; H01L21/027
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Hironori Honda
Toshimitsu Ichikawa