EXPOSURE DEVICE, EXPOSING METHOD, AND METHOD OF MANUFACTURING DEVICE

Title:

EXPOSURE DEVICE, EXPOSING METHOD, AND METHOD OF MANUFACTURING DEVICE

Document Type and Number:

Japanese Patent JP2010097129

Kind Code:

A

Abstract:

To provide an exposure device suppressing exposure failure.

The exposure device includes: a projection optical system for forming a projection image on a substrate by an exposure light; a detector for detecting a position of the substrate; an aligning device for aligning relatively the projection image with the substrate based on a detection result from the detector; a storage device for storing correlation information on relation between at least one of a position of the projection image and a detection reference position in the position detection, and an irradiation amount of the exposure light; a measuring instrument for measuring the irradiation amount of the exposure light; and a calibration device for calibrating at least one of the projection optical system, the detector and the aligning device, based on the result obtained from the measuring instrument and the correlation information.

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Inventors:

SAKO NAOYA
HARADA KEIKAI
MOROE JUNICHI
KIMURA MICHIHIRO
KATO MASANORI

Application Number:

JP2008269829A

Publication Date:

April 30, 2010

Filing Date:

October 20, 2008

Export Citation:

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Assignee:

NIKON CORP

International Classes:

G03F9/00; H01L21/027

Attorney, Agent or Firm:

Masatake Shiga
Tadashi Takahashi
Kazuya Nishi

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