EXPOSURE DEVICE AND MANUFACTURING METHOD OF DEVICE UTILIZING IT

Title:

EXPOSURE DEVICE AND MANUFACTURING METHOD OF DEVICE UTILIZING IT

Document Type and Number:

Japanese Patent JP2007103882

Kind Code:

A

Abstract:

To improve the utilization efficiency of either one of the calibration of a unit constituting an exposure device and measurement by the unit.

The exposure device transfers a pattern formed on an original plate 2 through a projection optical system 5 to a substrate 8. The exposure device comprises a judgement part 90 for judging the validity of the calibration or the measurement, on the basis of the state amount of the unit when either one of the calibration of the unit constituting the exposure device and the measurement by the unit is executed and the state amount of the unit at present; and a control unit 70 for making either one of the calibration and the measurement be executed again on the basis of the judged result of the judgement part 90.

Inventors:

AMANO TOSHITAKA

Application Number:

JP2005295557A

Publication Date:

April 19, 2007

Filing Date:

October 07, 2005

Export Citation:

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Assignee:

CANON KK

International Classes:

H01L21/027; G03F7/20

Domestic Patent References:

JP2005057205A	2005-03-03
JPH05160003A	1993-06-25
JP2005303042A	2005-10-27
JPH10303115A	1998-11-13
JPH05210049A	1993-08-20
JPH11258498A	1999-09-24
JPH04127514A	1992-04-28
JP2002231611A	2002-08-16
JP2001015401A	2001-01-19

Attorney, Agent or Firm:

Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura

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