To provide a device of washing a substrate capable of obtaining an excellent washing effect by discharging washing liquid on a substrate from a washing area, by utilizing the flow of a gas and making the washing liquid act on particles stuck to the surface of the substrate without attenuating the velocity of the flow of the washing liquid on the surface of the substrate.
The device 1 of washing the substrate includes a liquid flow nozzle body 4 provided facing the surface 2a to be washed of the substrate 2 for discharging the washing liquid 3 to the surface 2a to be washed of the substrate 2, and a gas flow nozzle body 6 provided facing the surface 2a to be washed of the substrate 2 more on the upstream side relative to a substrate carrying direction S than the liquid flow nozzle body 4 for discharging the gas 5 to the surface 2a to be washed of the substrate 2. The washing liquid 3 is discharged by the gas 5 from the gas flow nozzle body 6 more on the upstream side of the substrate carrying direction S than a position where the washing liquid 3 is supplied from the liquid flow nozzle body 4 to the surface 2a to be washed.
Takeshi Sugiyama
Minetarou Hirose
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