Title:
EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2015079813
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an exposure device in which both problems, i.e., loss of focus precision and loss of alignment precision due to elastic deformation of the body structure, and reduction in the number of substrates processed due to use of a measuring instrument of a look-ahead area, are solved.SOLUTION: With regard to the loss of focus accuracy, means for calculating and predicting the focus variation, in real time, when the body structure deforms elastically, by using the positional displacement amount and the position of a substrate stage or an original stage, is provided.
Inventors:
YAMADA NOBUMITSU
YAMANAKA TAKUMA
NAGANO KOHEI
YAMANAKA TAKUMA
NAGANO KOHEI
Application Number:
JP2013215193A
Publication Date:
April 23, 2015
Filing Date:
October 16, 2013
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027; G01B11/03; G03F7/20; H01L21/68
Attorney, Agent or Firm:
Yukio Takanashi